WF₆
Industrial & Specialty Gases
Tungsten Hexafluoride
WF₆ is used for chemical vapor deposition of tungsten films in semiconductor interconnect fabrication and other advanced applications.
Atomic #
0
Atomic Wt
297.83
CAS #
7783-82-6
Purity
99+%
Available Forms
Compressed gas
Specialty containers
Ultra-pure cylinders
Purity Grades
99.9%
99.99%
99.999%
Applications
Semiconductor
- ✓Tungsten CVD
- ✓Interconnect deposition
- ✓Barrier layers
Technical Specifications
| Boiling Point | 17.5°C |
| Density (gas @ STP) | 13.3 kg/m³ |
| Reactivity | Reacts with moisture |
| Purity | High purity critical |
| Handling | Requires dry conditions |
Storage Requirements
Store in dry conditions. Protect from moisture.
Packaging Options
- •Specialty cylinders
- •Ultra-pure containers
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