HfO₂
Precious Metal Compounds
Hafnium Oxide
Hafnium oxide is used in advanced semiconductor device fabrication and high-temperature applications.
Atomic #
0
Atomic Wt
210.49
CAS #
12055-23-1
Purity
99+%
Available Forms
Powder
Pellets
Films
Purity Grades
99%
99.5%
99.9%
Applications
Semiconductor
- ✓Gate dielectric
- ✓Advanced devices
Optical & Display
- ✓Optical coatings
Technical Specifications
| Melting Point | 2758°C |
| Density | 9.68 g/cm³ |
| Purity | 99%+ typical |
| Hafnium Content | 85% |
| Band Gap | 5.7-6.1 eV |
Storage Requirements
Store in dry environment.
Packaging Options
- •500mg bags
- •1kg containers
- •5kg vessels
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